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dc.contributor.authorBurke, Daviden_US
dc.contributor.authorGhosh, Abhijeeten_US
dc.contributor.authorHeidrich, Wolfgangen_US
dc.contributor.editorKavita Bala and Philip Dutreen_US
dc.date.accessioned2014-01-27T14:48:37Z
dc.date.available2014-01-27T14:48:37Z
dc.date.issued2005en_US
dc.identifier.isbn3-905673-23-1en_US
dc.identifier.issn1727-3463en_US
dc.identifier.urihttp://dx.doi.org/10.2312/EGWR/EGSR05/147-156en_US
dc.description.abstractImage-based representations for illumination can capture complex real-world lighting that is difficult to represent in other forms. Current importance sampling strategies for image-based illumination have difficulties in cases where both the illumination and the surface BRDF contain important high-frequency detail for example, when a specular surface is illuminated by an environment map containing small light sources. We introduce the notion of bidirectional importance sampling, in which samples are drawn from the product distribution of both the surface reflectance and the light source energy. While this approach makes the sample selection process more expensive, we drastically reduce the number of visibility tests required to obtain good image quality. As a consequence, we achieve significant quality improvements over previous sampling strategies for the same compute time. Keywords: Methods and Applications Monte Carlo Techniques; Rendering Ray Tracing; Rendering Global Illumination.en_US
dc.publisherThe Eurographics Associationen_US
dc.subjectCategories and Subject Descriptors (according to ACM CCS): I.3.7 [COMPUTER GRAPHICS]: Three-Dimensional Graphics and Realism, Raytracing.en_US
dc.titleBidirectional Importance Sampling for Direct Illuminationen_US
dc.description.seriesinformationEurographics Symposium on Rendering (2005)en_US


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